plasma source
英 [ˈplæzmə sɔːs]
美 [ˈplæzmə sɔːrs]
网络 等离子体源; 等离子源; 等离子体光源; 电浆源
双语例句
- Study on Low Power Inductively-Coupled Microwave Plasma Source Based on Planar Spiral Microstrip
小功率平面螺旋电感耦合微波等离子体源的研究 - Combined with inductive coupled plasma source, MS can determine if water is polluted by elements like As or Pb.
结合电感等离子离子源，质谱是水中重金属等元素的检测的标准方法。 - Due to the sample being introduced as an aerosol through the innermost concentric tube of the plasma source at a frequency of about 27 MHz, the skin effect occurs.
由于样品以气溶胶的形式通过最中间同心管引入频率为27MHz的等离子光源，出现趋肤效应。 - Two-dimensional Particle-in-Cell Simulation of Plasma Source Ion Implantation for Loop Sample
环状样品等离子体源离子注入过程两维Particle-in-Cell计算机模拟 - Study on Low-Power Microwave Plasma Source Based on Microstrip Split-Ring Resonator
基于微带环缝谐振器的小功率微波等离子体源 - Optical thin film properties deposited using the adapted high ion current plasma source are likewise described.
最后描述了利用高离子电流密度等离子体镀膜的光学薄膜。 - PIC Simulation of Grid-Shadow Effect in Plasma Source Ion Implantation
等离子体源离子注入中的栅网阴影效应的离子动力学PIC模拟 - Numerical Simulation of Large-Scale Rectangular Surface-Wave Plasma Source
大面积矩形表面波等离子体源的数值模拟 - The results show that the ECR plasma source may generate stable, high density plasma with low electron temperature.
实验证明，ECR等离子体源能够稳定地产生电子温度较低的高密度等离子体。 - Diamond films had been deposited on quartz tube with the gas mixture of ethanol steam and hydrogen by the plasma source.
使用该等离子体源以乙醇蒸汽和氢气为气源在石英玻璃管外表面沉积金刚石膜。 - Progress in the Method of Laser Ablation Solid Sample Introduction to Inductively Coupled Plasma Source
ICP光源的激光烧蚀固体样品引入方法进展 - The Miniaturized Inductively Coupled Plasma Source and Its Characteristics
小型感应耦合等离子体源及其等离子体特性 - With these advantages, Microwave ECR plasma finds number of applications in the areas of etching technologies, thin film deposition and plasma source.
建立了ECR微波等离子体源离子输运的平板和圆柱模型，对离子历经的空间区域的输运过程进行了数值研究。 - Low power microwave plasma source based on microstrip split-ring resonator fed directly
直接馈电微带缝环谐振器实现微波等离子体源 - The design method for space plasma source and measurement system is introduced in this paper.
文章介绍了空间等离子体源与测试系统的设计方法。 - Plasma generation and the conventional radio frequency ( rf) capacitively coupled diode plasma source were briefly discussed.
本文简要地介绍了等离子体的产生方式以及传统的射频电容耦合等离子体源。 - Plasma source ion implantation is a new non-line of sight ion implantation technique for surface modification of materials.
等离子体源离子注入技术是一种新型的非视线的离子注入材料表面改性技术。 - In this paper, a glow discharge plasma source ion implantation technique is described.
本文叙述了辉光放电等离子体源的等离子体源离子注入。 - The application of plasma source ion implantation technique to the oil distributing disk of aeronautical hydraulic pump was studied.
对等离子体源离子注入技术在航空液压泵配油盘上的应用进行了研究。 - A new large area microwave plasma source has been developed.
研制了一种新的大面积微波等离子体源。 - This research approach is applicable to the mask distortions caused by the other synchronous radiation sources and plasma source.
这种研究方法对其他同步辐射光源和等离子脉冲X射线作用下的掩模畸变研究都是普遍适用的。 - The design and experimental investigation of a new type plasma source produced by electromagnetic surface waves is given.
研制了一种新型电磁表面波等离子体源，并对其参数和特性进行了实验研究。 - Plasma source injection technique is a new technique which uses plasma ion sources for surface processing and modification.
等离子体源注入技术是利用等离子体为离子源进行材料表面处理和改性的新兴技术。 - The study provides the basis for further miniaturization of low-power microwave plasma source.
这为小功率微波微等离子体源的进一步小型化研究提供基础。 - Recently plasma source ion implantation ( PSII) has been widely applied to modify the surface properties of materials.
近年来，等离子体源离子注入（PSII）在改善材料表面性能方面得到了广泛应用。 - Plasma source ion implantation ( PSII) has been widely used in surface modification and semiconductor fabrication.
等离子体源离子注入（PSII）已经广泛应用于材料表面改性和半导体加工领域。 - A new plasma source ion implantation device for inner and outer surface implantation of materials has been developed.
本文研制了一套可同时用于材料内外表面注入的新型等离子体源离子注入装置。 - We demonstrated the plasma diagnosis by Langmuir probe and discussed the characteristics of our plasma source.
通过对Langmuir探针的诊断结果分析，我们对该装置的电感耦合等离子体源的放电特性进行了详细讨论。 - On the base of the high density ECR plasma source, we design multi-holes and single-hole ion sources and preliminary measure the ion flux.
在ECR高密度等离子体源的基础上设计加工了多孔和单孔离子源，对离子源的离子通量作了初步的估算。